The decomposition mechanisms of SF6 and its candidate C5F10O
5th International Conference on Plasam Chemistry and Plasma Processing
November 13-14, 2017 Paris, France
Xi’an Jiaotong University, China
Scientific Tracks Abstracts : J Biot Phyt
The decomposition mechanisms of SF6 with impurities (moisture and trace oxygen) and one of its candidates- C5F10O, were thoroughly studied in this paper. The quantum chemistry methods were adopted to investigate the decomposition processes of SF6 and C5F10O. We also calculated the rate constants of the chemistry reactions included in above processes over a large temperature range from 300 K to 12,000 K. The dominant reactions and species in the decomposition were finally determined. The decomposition mechanisms of SF6 are hoping to lay a theoretical basis for service life condition onlinemonitoring of power equipment by analyzing SF6 decomposition components. And the results of C5F10O play an important role in the feasibility study on alternative gas for SF6 and can be used to further investigate the corresponding eco-friendly switchgear in the future.
Xiaohua Wang received his BSc degree from Chang’an University, Xi’an, China in 2000 and PhD degree from School of Electrical Engineering of Xi’an Jiaotong University, China, in 2006. His research interests are mainly in plasma chemistry, design and fault diagnosis technologies of electrical apparatus. He has published more than 100 peer-reviewed papers. He is an awardee of supporting program of new century excellent talents in University of the Ministry of Education.