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Notes:

Page 17

November 13-14, 2017 Paris, France

5

th

International Conference on

PLASMA CHEMISTRY AND

PLASMA PROCESSING

Journal of Biotechnology and Phytochemistry

Volume 1, Issue 2

Plasma Chemistry 2017

Densities of active species in N

2

RF and HF afterglows

A Ricard

1

, J P Sarrette

1

, Y Wang

2

and

Y K Kim

2

1

University of Toulouse, France

2

Ajou University, South Korea

N

2

flowing afterglow emissions have been analyzed by

optical emission spectroscopy in tubes of 21 and 18 mm

internal diameter connected to RF and HF sources available

in Suwon and Toulouse, respectively. The N

2

1

st

pos (580 nm),

2

nd

pos (316 nm) and N

2

+ 1

st

neg (391.4 nm) band system

intensities were recorded across the tube diameters from the

pink (early) to the late afterglows at pressure 6-8 Torr, total flow

rate 0.5-0.6 slm and input power of 100 watt. After calibration

of the N atom density by NO titration, the concentrations of

N-atoms, O-atoms coming from gas impurities, N

2

(X, v>13),

N

2

(A) metastable molecules and N

2

+ ions were determined

in N

2

afterglows. It is found that N–atom density nearly

constant from the pink to the late afterglow. For similar

afterglow times, active species densities are higher in HF than

in RF: 2 and 0.4x10

15

cm-

3

, respectively. Anatase nanocrystals

and ALD (Atomic Layer Deposition) TiO

2

samples were

exposed to the RF and HF afterglows at room temperature.

XPS analysis of samples submitted to the RF afterglow has

shown that the best N/Ti coverage: 0.24 was obtained in the

N

2

late afterglow where the N atoms are the most populated

active species. In the HF late afterglow, the N/Ti coverage was

limited to 0.04 in spite of higher N-atom density: (1-2)x10

15

cm-

3

. Such results are explained by higher O-atom impurity

in HF: 2x10

13

cm-

3

in comparison to 8x10

11

cm-

3

in RF. Then,

the N/O ratios in the RF and HF afterglows were respectively

(0.5-1)x102 and 5x102 with the same variations as found for

the N/Ti coverages.

Biography

A Ricard worked at Ecole Polytechnique as a physicist from (1960-1962).

Then form 1962-1964 he worked at Institut Optique as Engineer, from 1964-

1967 worked at Sud-Aviation as Engineer, from 1967- 2007 he worked as a

researcher in CNRS. He received his PhD in 1971 form University of Toulouse.

He is expertise in the field of plasma spectroscopy, kinetics of plasma excited

species, applications to surface treatments.

ricard@laplace.univ

-tlse

A Ricard et al., J Biot Phyt 2017